| 摘要 |
A manufacturing method is provided for a solid-state imaging device which is easy to manufacture while having excellent reliability as a product. A method for manufacturing a solid-state imaging device 1A comprises a first step of preparing an imaging element 10 having a first principal surface S1 for receiving an energy ray incident thereon, a second principal surface S2 opposing the first principal surface S1 and having at least one electrode 14 arranged thereon, and a photoelectric converter part 11 for photoelectrically converting the incident energy ray so as to generate a signal charge; a second step of preparing a support substrate 20, provided with at least one through hole 23 extending in a thickness direction thereof, having third and fourth principal surfaces S3, S4 opposing each other; a third step of aligning the imaging element 10 and the support substrate 20 with each other so that the electrode 14 is exposed out of the through hole 23 while the second and third principal surfaces S2, S3 oppose each other and joining the imaging element 10 and the support substrate 20 to each other; and a fourth step of arranging a conductive ball-shaped member 30 in the through hole 23 and electrically connecting the ball-shaped member 30 to the electrode 14 after the third step. |
