发明名称 Apparatus of treating substrate, and methods of manufacturing substrate for electronic device and flat display device using the same
摘要 <p>The present invention relates to a substrate processing apparatus and methods for manufacturing a substrate for an electronic device and a flat panel display device using the same. The substrate processing apparatus according to the embodiment of the present invention includes a first electrode part on which a substrate is loaded, a second electrode part which faces the first electrode part and forms plasma, and a third electrode part which is located outside the second electrode part and is connected to a DC power source unit.</p>
申请公布号 KR101506000(B1) 申请公布日期 2015.03.27
申请号 KR20130021225 申请日期 2013.02.27
申请人 发明人
分类号 G02F1/13;H01L21/205;H01L21/3065;H05H1/46 主分类号 G02F1/13
代理机构 代理人
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