POLISHING COMPOSITION

摘要

The present invention is a polishing composition containing: silica having functional groups that satisfy at least one of the following conditions (1) and (2), the functional groups immobilized on the surface of the silica; and a pH adjuster. Condition (1): The functional groups have amino groups. Condition (2): The functional groups have halogeno groups. This polishing composition makes it possible to adequately control the polishing rate of Si-containing material.