| 摘要 |
The invention relates to a facet mirror (100), in particular for use as an optical component in a projection exposure apparatus for EUV microlithography, comprising at least two mirror modules (105) having individual mirrors (110) and mirror module surfaces (129) and at least on one side a non-reflective edge region (120) and a module edge (121), wherein adjacent individual mirrors (110) in the mirror modules (105) are at a distance from one another that is less than half the width of the non-reflective edge region (120), and the at least two adjacent module edges (121) of adjacent mirror modules (105) are arranged in a manner offset with respect to one another by a height h along the surface normal (135) of one of the two mirror module surfaces (129). |
