发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK |
摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A); |
申请公布号 |
US2015086911(A1) |
申请公布日期 |
2015.03.26 |
申请号 |
US201414560650 |
申请日期 |
2014.12.04 |
申请人 |
FUJIFILM Corporation |
发明人 |
TSURUTA Takuya;TSUCHIMURA Tomotaka;YATSUO Tadeteru |
分类号 |
G03F7/027;G03F7/20 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. wherein, in the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group; Z represents a hydrogen atom or a substituent; and * represents a linking site with a residue of the compound (A). |
地址 |
Tokyo JP |