发明名称 DEVICE AND METHOD FOR FORMING RESISTIVE RANDOM ACCESS MEMORY CELL
摘要 A device and method for forming resistive random access memory cell are provided. The method includes: providing a first voltage to a first word line connected to a first RRAM cell to form the first RRAM cell; and providing a negative voltage to a second word line connected to a second RRAM cell that shares a first source line and a first bit line with the first RRAM cell. An exemplary device includes: a first RRAM cell, a second RRAM cell, a first voltage source and a charge pump circuit. The first RRAM cell is connected to a first word line. The second RRAM cell is connected to a second word line. The first voltage source provides a first voltage to the first word line to form the first RRAM cell. The charge pump circuit provides a negative voltage to the second word line.
申请公布号 US2015085558(A1) 申请公布日期 2015.03.26
申请号 US201314034717 申请日期 2013.09.24
申请人 Taiwan Semiconductor Manufacturing Company Limited 发明人 CHANG CHIH-YANG;CHU WEN-TING;TING YU-WEI;TSAI CHUN-YANG;HUANG KUO-CHING
分类号 G11C13/00 主分类号 G11C13/00
代理机构 代理人
主权项 1. A device, comprising: a first resistive random access memory (RRAM) cell, connected to a first word line; a second RRAM cell, connected to a second word line; a first voltage source, providing a first voltage to the first word line to form the first RRAM cell; and a charge pump circuit, providing a negative voltage to the second word line.
地址 Hsinchu TW