| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing methane fluoride useful as dry etching gas or the like, which is more suitable for industrial production.SOLUTION: There is provided a method for producing methane fluoride (CHF) by reacting (A) dimethyl sulfate and (B) at least one selected from the group consisting of a hydrogen fluoride and a hydrofluoric acid salt, or a fluoride metal salt as a fluoride compound in a liquid phase. The reaction is carried out without a solvent or using a polar solvent as the solvent when the fluoride compound (B) contains a hydrogen fluoride or a hydrofluoric acid salt and the reaction is carried out using water as the solvent when the fluoride compound (B) is a fluoride metal salt. |
