PROJECTION OPTICAL SYSTEM, METHOD FOR ADJUSTING PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD

摘要

Provided is a projection optical system in which, for example, wave aberration caused by light irradiation can be adjusted. This projection optical system forms an image of a first surface on a second surface. The projection optical system comprises: a first image-forming optical unit that is arranged in an optical path between the first surface and the second surface, and that includes a first concave-surface reflection mirror having a deformable reflection surface; and a second image-forming optical unit that is arranged in an optical path between the first image-forming optical unit and the second surface, and that includes a second concave-surface reflection mirror having a deformable reflection surface.