发明名称 MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION
摘要 A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.
申请公布号 US2015087792(A1) 申请公布日期 2015.03.26
申请号 US201414560358 申请日期 2014.12.04
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HIRANO Yoshinori;YANAGISAWA Hideyoshi
分类号 C08G8/28;G03F7/038 主分类号 C08G8/28
代理机构 代理人
主权项 1. A method of preparing a modified novolak phenolic resin, comprising the steps of mixing (A) a novolak phenolic resin obtained from condensation of a phenol containing at least 50% by weight of p-cresol and an aldehyde, or (B) a mixture of (b-1) at least 50% by weight of a p-cresol novolak resin obtained from condensation of p-cresol and an aldehyde and (b-2) the balance of another novolak phenolic resin obtained from condensation of a phenol other than p-cresol and an aldehyde with a crosslinker, simultaneously or subsequently adding an acidic catalyst selected from the group consisting of oxalic acid, acetic acid, benzenesulfonic acid, p-toluenesulfonic acid, xylenesulfonic acid, p-phenolsulfonic acid, methanesulfonic acid, and ethanesulfonic acid thereto, and effecting reaction at a temperature of 10 to 80° C.
地址 Tokyo JP