| 发明名称 |
DEPOSITION APPARATUS |
| 摘要 |
A deposition apparatus comprises a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit. |
| 申请公布号 |
US2015083586(A1) |
申请公布日期 |
2015.03.26 |
| 申请号 |
US201414484739 |
申请日期 |
2014.09.12 |
| 申请人 |
CANON ANELVA CORPORATION |
发明人 |
ONO Teruaki;SHIBAMOTO Masahiro |
| 分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A deposition apparatus comprising:
a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit. |
| 地址 |
Kawasaki-shi JP |
