| 摘要 |
<p>Provided are a coating and developing apparatus capable of flexibly changing a returning schedule. The coating and developing apparatus (1) forms a coating film including a resist film on a substrate (W), and performs a developing process of the substrate after exposure. Each of multiple unit blocks (B1 to B6) performing the same process includes multiple types of processing modules (SCPL, COT, and PAB). A control unit outputs (6) control signals to perform the following steps of: making an individual returning schedule for one substrate (W) according to situations when the one substrate (W) to be distributed to a unit block (B3, B4) is distributed to each unit block (B3, B4); calculating stay time of the one substrate in each unit block (B3, B4) from going into until coming out; and conveying the one substrate (W) to a unit block (B3, B4) having the shortest stay time, and returning the substrate (W) based on the individual returning schedule.</p> |
