发明名称 |
マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法 |
摘要 |
In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface. |
申请公布号 |
JP5689147(B2) |
申请公布日期 |
2015.03.25 |
申请号 |
JP20130098566 |
申请日期 |
2013.05.08 |
申请人 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
发明人 |
マン,ハンス−ユルゲン;ユーリッヒ,ヴィルヘルム;プレトリウス,マルコ |
分类号 |
G02B17/00;G03F7/20;H01L21/027 |
主分类号 |
G02B17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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