发明名称 Semiconductor Device Capable Of Suppressing Short Channel Effect And Method Of Fabricating The Same
摘要 <p>A semiconductor device includes a semiconductor substrate including at least one memory channel region and at least one memory source/drain region, the memory channel region and the memory source/drain region being arranged alternately, and at least one word line on the memory channel region, wherein the memory source/drain region has a higher net impurity concentration than the memory channel region.</p>
申请公布号 KR101503875(B1) 申请公布日期 2015.03.25
申请号 KR20080024520 申请日期 2008.03.17
申请人 发明人
分类号 H01L21/22;H01L21/336;H01L21/8247 主分类号 H01L21/22
代理机构 代理人
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