| 摘要 |
<p>The invention provides a substrate cleaning device and a method, a producing device of a display means and a producing method thereof. Cleaning steps can be reduced and polluted particles can be prevented from attaching to the substrate. The substrate cleaning device (1) comprises a conveying part (2), a conveying substrate (W), and a supply nozzle (3) which supplies cleaning liquid to a surface (S) to be cleaned of the substrate (W). The cleaning liquid contains oxidizing gas in dissolving state and fine bubble state in liquid with oxidation films being removed. The cleaning liquid is supplied at a flow speed that fine bubbles reaching to the surface (S) to be cleaned are prevented from size change while moving to the outer edge of the substrate (W).</p> |
