| 摘要 |
<p>The invention provides a substrate processing method. Even the substrate deviates immediately after the discharging begins, the detection can be realized as soon as possible and the processing can be stopped immediately. Thus, carrying table damage caused by abnormal discharge can be prevented to the utmost. The method includes steps of starting discharge by providing high frequency power to a processing container. Plasma of the processing gas is generated on the processing substrate on the substrate retaining face. In the discharging process, a plurality of judging point are set before a point that the flowing volume of the heat transferring gas becomes stable. In the judging point, when the flowing volume of the heat transferring gas detected by the flow sensor surpasses a predetermined threshold value, that the substrate deviation occurs is judged. Since threshold values are set at each judging points, the substrate deviation can be judge not until the flow of the heat transferring gas becomes stable.</p> |
