发明名称 半導体装置の作製方法
摘要 It is an object of the invention to provide a peeling method which does not damage a peeling layer, and to perform peeling not only a peeling layer having a small-size area but also an entire peeling layer having a large-size area with a preferable yield. In the invention, after pasting a fixing substrate, a part of a glass substrate is removed by scribing or performing laser irradiation on the glass substrate which leads to providing a trigger. Then, peeling is performed with a preferable yield by performing peeling from the removed part. In addition, a crack is prevented by covering the entire face except for a connection portion of a terminal electrode (including a periphery region of the terminal electrode) with a resin.
申请公布号 JP5690876(B2) 申请公布日期 2015.03.25
申请号 JP20130124324 申请日期 2013.06.13
申请人 株式会社半導体エネルギー研究所 发明人 後藤 裕吾;福本 由美子;高山 徹;丸山 純矢;鶴目 卓也
分类号 H01L21/02;H01L29/786;G02F1/1368;G09F9/00;H01L21/20;H01L21/336;H01L21/762;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L51/50;H01L51/52;H01L51/56;H05B33/02;H05B33/10 主分类号 H01L21/02
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