ROTATING DISK REACTOR WITH FERROFLUID SEAL FOR CHEMICAL VAPOR DEPOSITION
摘要
A rotating disk reactor for chemical vapor deposition includes a vacuum chamber and a ferrofluid feedthrough comprising an upper and a lower ferrofluid seal that passes a motor shaft into the vacuum chamber. A motor is coupled to the motor shaft and is positioned in an atmospheric region between the upper and the lower ferrofluid seal. A turntable is positioned in the vacuum chamber and is coupled to the motor shaft so that the motor rotates the turntable at a desired rotation rate. A dielectric support is coupled to the turntable so that the turntable rotates the dielectric support when driven by the shaft. A substrate carrier is positioned on the dielectric support in the vacuum chamber for chemical vapor deposition processing. A heater is positioned proximate to the substrate carrier that controls the temperature of the substrate carrier to a desired temperature for chemical vapor deposition.
申请公布号
EP2850221(A1)
申请公布日期
2015.03.25
申请号
EP20130791326
申请日期
2013.05.09
申请人
VEECO INSTRUMENTS INC.
发明人
BARRISS, LOUISE, S.;COMUNALE, RICHARD, A.;FREMGEN, ROGER, P.;GURARY, ALEXANDER, I.;LUSE, TODD, A.;MILGATE, III, ROBERT, WHITE;POLLOCK, JOHN, D.