发明名称 |
Group V doping of GaAs-based layers to improve radiation tolerance of solar cells |
摘要 |
Methods for improving the performance and lifetime of irradiated photovoltaic cells are disclosed, whereby Group-V elements, and preferably nitrogen, are used to dope semiconductor GaAs-based subcell alloys. |
申请公布号 |
US8987129(B2) |
申请公布日期 |
2015.03.24 |
申请号 |
US201213627481 |
申请日期 |
2012.09.26 |
申请人 |
The Boeing Company |
发明人 |
Boisvert Joseph C.;Fetzer Christopher M. |
分类号 |
H01L21/28;H01L31/0687 |
主分类号 |
H01L21/28 |
代理机构 |
Smith Moore Leatherwood LLP |
代理人 |
Smith Moore Leatherwood LLP |
主权项 |
1. A method for repairing radiation-induced damage to photovoltaic cells comprising the steps of:
providing a photovoltaic cell made by sequentially growing semiconductor alloys that are lattice-matched to a Ge substrate; providing at least one subcell layer comprising a GaAs-based material having a lattice and a first current and voltage retention; providing at least one subcell layer material comprising an amount of group-V element, said group-V element subcell layer located proximate to the GaAs-based subcell layer; doping the GaAs-based subcell with a group-V element dopant; and providing an amount of the group-V element for migration into the GaAs-based material lattice substantially immediately after exposure of the photovoltaic cell to radiation. |
地址 |
Chicago IL US |