发明名称 Manufacturing method for a porous microneedle array and corresponding porous microneedle array and corresponding substrate composite
摘要 A manufacturing method for a porous microneedle array includes: forming a plurality of porous microneedle arrays, each having at least one microneedle and a porous carrier zone lying beneath it on the face of a semiconductor substrate; forming an interlayer between a non-porous residual layer of the semiconductor substrate located on the back side of the semiconductor substrate and the carrier zone, which has greater porosity than the carrier zone; detaching the residual layer from the carrier zone by breaking up the interlayer; and separating the microneedle arrays into corresponding chips.
申请公布号 US8986256(B2) 申请公布日期 2015.03.24
申请号 US201012925804 申请日期 2010.10.29
申请人 Robert Bosch GmbH 发明人 Scholten Dick;Stumber Michael;Laermer Franz;Feyh Ando
分类号 A61M5/00;A61M37/00;B81C1/00 主分类号 A61M5/00
代理机构 Kenyon & Kenyon LLP 代理人 Kenyon & Kenyon LLP
主权项 1. A porous microneedle array, comprising: a porous carrier zone formed at a face of a semiconductor substrate; plurality of microneedles disposed on a portion of the porous carrier zone between edge structures disposed on the face of the semiconductor substrate, wherein the edge structures vertically rise to above the plurality of microneedles; and a plastic cap positioned over the plurality of microneedles and covering the plurality of microneedles, wherein the plastic cap includes a surface extending continuously in a plane between flanges that interact with the edge structures for positioning the surface over the plurality of microneedles.
地址 Stuttgart DE