发明名称 |
Manufacturing method for a porous microneedle array and corresponding porous microneedle array and corresponding substrate composite |
摘要 |
A manufacturing method for a porous microneedle array includes: forming a plurality of porous microneedle arrays, each having at least one microneedle and a porous carrier zone lying beneath it on the face of a semiconductor substrate; forming an interlayer between a non-porous residual layer of the semiconductor substrate located on the back side of the semiconductor substrate and the carrier zone, which has greater porosity than the carrier zone; detaching the residual layer from the carrier zone by breaking up the interlayer; and separating the microneedle arrays into corresponding chips. |
申请公布号 |
US8986256(B2) |
申请公布日期 |
2015.03.24 |
申请号 |
US201012925804 |
申请日期 |
2010.10.29 |
申请人 |
Robert Bosch GmbH |
发明人 |
Scholten Dick;Stumber Michael;Laermer Franz;Feyh Ando |
分类号 |
A61M5/00;A61M37/00;B81C1/00 |
主分类号 |
A61M5/00 |
代理机构 |
Kenyon & Kenyon LLP |
代理人 |
Kenyon & Kenyon LLP |
主权项 |
1. A porous microneedle array, comprising:
a porous carrier zone formed at a face of a semiconductor substrate; plurality of microneedles disposed on a portion of the porous carrier zone between edge structures disposed on the face of the semiconductor substrate, wherein the edge structures vertically rise to above the plurality of microneedles; and a plastic cap positioned over the plurality of microneedles and covering the plurality of microneedles, wherein the plastic cap includes a surface extending continuously in a plane between flanges that interact with the edge structures for positioning the surface over the plurality of microneedles. |
地址 |
Stuttgart DE |