Apparatus and methods for handling workpieces in a processing system

摘要

Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system, is adapted to transfer a workpiece (55) to and from a pedestal portion (286) of an electrode (24). The pedestal portion (286) is configured to support the workpiece (55) during processing. The workpiece vertical lift mechanism (200) including a workpiece fixture (290) movable relative to the pedestal portion (286) between a first position in which the workpiece fixture (290) holds the workpiece (55) in a non-contacting relationship with the pedestal portion (286) and a second position in which the pedestal portion (286) projects above workpiece fixture (290) so as to transfer the workpiece (55) from the workpiece fixture (290) to the pedestal portion (286).

主权项

1. A method of processing a workpiece supported on a pedestal portion of a lower electrode in a process chamber of a processing system, the method comprising:
transferring a workpiece to a lift plate disposed at a first position between the lower electrode and an upper electrode inside the process chamber and in a non-contacting relationship with the pedestal portion; supporting the workpiece about an opening in the lift plate while the lift plate is disposed at the first position; moving the lift plate vertically from the first position toward the pedestal portion of the lower electrode and to a second position at which the workpiece is transferred from the lift plate to the pedestal portion; generating a plasma inside the process chamber using the lower electrode and the upper electrode after the workpiece is transferred from the opening in the lift plate to the pedestal portion; and processing the workpiece with the plasma while the workpiece is supported on the pedestal portion of the lower electrode.