| 发明名称 | Lithographic apparatus and device manufacturing method | ||
| 摘要 | A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction. | ||
| 申请公布号 | US8988657(B2) | 申请公布日期 | 2015.03.24 |
| 申请号 | US201213541300 | 申请日期 | 2012.07.03 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Van Boxtel Frank Johannes Jacobus;Gosen Jeroen Gerard;Kuijper Anthonie;Martens Arjan Hubrecht Josef Anna;Van Damme Jean-Philippe Xavier;Schoenmakers Peter;Evers Franciscus Joannes Anthonius;Van Empel Jaap Wilhelmus Petrus;Coumans Léon Hubert Joseph;Gerritzen Justin Johannes Hermanus |
| 分类号 | G03F7/20 | 主分类号 | G03F7/20 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic apparatus, comprising: a component configured to be moved in at least a first direction during use of the lithographic apparatus, the component including a passive gas flow system comprising: a gas inlet configured such that, when the component moves in the first direction in a non-vertical plane, the movement of the component in the first direction drives gas into the passive gas flow system; and a gas outlet, connected to the gas inlet by a gas conduit, configured to direct gas, that is driven into the passive gas flow system by the movement of the component in the first direction, in a direction that is selected from the range of approximately perpendicular to the plane to approximately 10° to the first direction and to the plane. | ||
| 地址 | Veldhoven NL | ||