发明名称 Fine droplet atomization for liquid precursor vaporization
摘要 A method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.
申请公布号 US8986784(B2) 申请公布日期 2015.03.24
申请号 US201313937996 申请日期 2013.07.09
申请人 MSP Corporation 发明人 Liu Benjamin Y. H.;Dinh Thuc M.;Ma Yamin
分类号 B05B17/04;B05B1/08;B01F3/04;C23C16/448 主分类号 B05B17/04
代理机构 Westman, Champlin & Koehler, P.A. 代理人 Westman, Champlin & Koehler, P.A. ;Sawicki Z. Peter;Prose Amanda
主权项 1. A method for atomizing a precursor liquid in a gas to form a droplet aerosol, the method comprising: drawing a gas from a compressed gas source; drawing a liquid from a liquid source; the liquid and gas conjoined in a radial flow atomizing head wherein direction of the gas flow in the radial flow atomizing head is radial and perpendicular to the direction of liquid flow in the radial flow atomizing head; and wherein the gas impinges on the liquid flow to form droplets for vaporization and thin film deposition on the substrate.
地址 Shoreview MN US