发明名称 Patterning apparatus
摘要 A patterning apparatus includes a stage arranged under a flexible substrate, a plurality of correction units arranged closely to the stage, attached to the flexible substrate, and configured to apply a tension force to the flexible substrate, and a pattern forming unit configured to form a pattern on the flexible substrate. The patterning apparatus corrects distortion of the flexible substrate by using the correction units.
申请公布号 US8985994(B2) 申请公布日期 2015.03.24
申请号 US201012960112 申请日期 2010.12.03
申请人 LG Display Co., Ltd. 发明人 Lee Nam Seok;Nam Seung Hee;Lee Shin Bok
分类号 B29C59/04;B29C55/20 主分类号 B29C59/04
代理机构 McKenna Long & Aldridge LLP 代理人 McKenna Long & Aldridge LLP
主权项 1. A patterning apparatus comprising: a stage disposed under a flexible substrate and having a plurality of first vacuum holes on a flat upper surface thereof; a plurality of correction units being adjacent to the stage, being attached to the flexible substrate, and applying a tension force to the flexible substrate; a pattern forming unit forming a pattern on the flexible substrate; a first roller winding the flexible substrate; a second roller releasing the flexible substrate, wherein the first roller winds the flexible substrate in a first direction, wherein the correction units are arranged along an entire perimeter of the stage, the correction units including a plurality of first correction units and a plurality of second correction units facing each other and applying a first tension force to the flexible substrate in a second direction substantially perpendicular to the first direction, and a plurality of third correction units and a plurality of fourth correction units facing each other and applying a second tension force to the flexible substrate in the first direction, and wherein the first tension force and the second tension force are different from each other, wherein each of the plurality of first to fourth correction units comprises: a suction unit sucked on a lower surface of the flexible substrate; a second vacuum hole formed in the suction unit; a vacuum pump connected to the suction unit; and a motor driving the suction unit and applying an individually controllable tension force to correct a non-symmetric distortion of the flexible substrate, wherein the correction units are disposed under the flexible substrate, wherein the correction units are adhered to or separated from the lower surface of the flexible substrate by vacuum pressure through the second vacuum hole, and a support for the correction units, wherein the support is separate from the stage and surrounds the correction units, wherein the correction units are fixed at an inner side of the support, and wherein the motor of the correction units is fixed to the support, and the correction units are separately driven.
地址 Seoul KR
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