发明名称 COPOLYMER, MONOMER COMPOSITION, RESIN SOLUTION, AND RESIN FILM
摘要 <p>A copolymer of the present invention comprises a repeating unit derived from phenylphenyl(meth)acrylate; a repeating unit derived from a hydroxyphenyl group-containing unsaturated compound; and a repeating unit derived from an epoxy group-containing unsaturated compound. The copolymer of the present invention brings together excellent transparency and a high refractive index. A resin film formed from the copolymer of the present invention can be suitably utilized in the formation of a protective film or interlayer insulating film for an electronic part such as a liquid crystal display device, an integrated circuit device, or a solid-state imaging device, the formation of a microlens or a microlens array, the formation of an optical waveguide, or the like.</p>
申请公布号 KR20150031464(A) 申请公布日期 2015.03.24
申请号 KR20157003245 申请日期 2013.07.08
申请人 SHOWA DENKO K.K. 发明人 TSUJIMURA YUMI;KOBAYASHI MASAYUKI;ICHIKAWA TAKAO;ENDO ATSUO
分类号 C08F220/18;C08F220/30;C08F220/32;C08L33/12;C08L63/00 主分类号 C08F220/18
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