发明名称 Metal barrier-doped metal contact layer
摘要 A photovoltaic device can include an intrinsic metal layer adjacent to a semiconductor absorber layer; and a doped metal contact layer adjacent to the intrinsic metal layer, where the doped metal contact layer includes a metal base material and a dopant.
申请公布号 US8987587(B2) 申请公布日期 2015.03.24
申请号 US201213615128 申请日期 2012.09.13
申请人 First Solar, Inc. 发明人 Cheng Long;Gupta Akhlesh;Abken Anke;Buller Benyamin
分类号 H01L31/00;H01L21/00;H01L31/0296;H01L31/18;H01L31/0224;H01L31/073 主分类号 H01L31/00
代理机构 Dickstein Shapiro LLP 代理人 Dickstein Shapiro LLP
主权项 1. A method for manufacturing a photovoltaic device, the method comprising: depositing an intrinsic metal layer on a semiconductor absorber layer; sputtering a doped metal contact layer on the intrinsic metal layer, the doped metal contact layer comprising a metal base material and a dopant material, wherein the metal base material is molybdenum, and wherein the dopant material is copper and the doped metal contact layer comprises a copper concentration of about 0.1% to about 10%; and forming a concentration gradient of the dopant material in the intrinsic metal layer by causing diffusion of at least some of the dopant material from the doped metal contact layer.
地址 Perrysburg OH US