摘要 |
<p>The present invention relates to an apparatus of washing a mask. The apparatus of washing a mask includes a support plate which supports a mask; a support plate driver which rotates the support plate; a chemical nozzle which injects a chemical onto the mask placed on the support plate; a nozzle driver which drivers the chemical nozzle; and a controller which controls the support plate driver and the nozzle driver. The controller controls the nozzle driver and moves the chemical nozzle to directly inject the chemical to a glue region where glue remains on the mask in a washing process.</p> |