发明名称 |
Segmented guard ring structures with electrically insulated gap structures and design structures thereof |
摘要 |
Disclosed are guard ring structures with an electrically insulated gap in a substrate to reduce or eliminate device coupling of integrated circuit chips, methods of manufacture and design structures. The method includes forming a guard ring structure comprising a plurality of metal layers within dielectric layers. The method further includes forming diffusion regions to electrically insulate a gap in a substrate formed by segmented portions of the guard ring structure. |
申请公布号 |
US8987067(B2) |
申请公布日期 |
2015.03.24 |
申请号 |
US201313782537 |
申请日期 |
2013.03.01 |
申请人 |
International Business Machines Corporation |
发明人 |
Barry Robert L.;Chapman Phillip F.;Gambino Jeffrey P.;Gautsch Michael L.;Jaffe Mark D.;Ogg Kevin N.;Orner Bradley A. |
分类号 |
H01L21/332;H01L21/762;H01L23/31 |
主分类号 |
H01L21/332 |
代理机构 |
Roberts Mlotkowski Safran |
代理人 |
Canale Anthony;Roberts Mlotkowski Safran |
主权项 |
1. A method, comprising:
forming a guard ring structure comprising a plurality of metal layers within dielectric layers; and forming diffusion regions to electrically insulate a gap in a substrate formed by segmented portions of the guard ring structure, wherein the diffusion regions are formed in a high resistivity substrate, and a noble implant region is implanted into the high resistivity substrate, below a shallow trench isolation (STI) structure. |
地址 |
Armonk NY US |