发明名称 Segmented guard ring structures with electrically insulated gap structures and design structures thereof
摘要 Disclosed are guard ring structures with an electrically insulated gap in a substrate to reduce or eliminate device coupling of integrated circuit chips, methods of manufacture and design structures. The method includes forming a guard ring structure comprising a plurality of metal layers within dielectric layers. The method further includes forming diffusion regions to electrically insulate a gap in a substrate formed by segmented portions of the guard ring structure.
申请公布号 US8987067(B2) 申请公布日期 2015.03.24
申请号 US201313782537 申请日期 2013.03.01
申请人 International Business Machines Corporation 发明人 Barry Robert L.;Chapman Phillip F.;Gambino Jeffrey P.;Gautsch Michael L.;Jaffe Mark D.;Ogg Kevin N.;Orner Bradley A.
分类号 H01L21/332;H01L21/762;H01L23/31 主分类号 H01L21/332
代理机构 Roberts Mlotkowski Safran 代理人 Canale Anthony;Roberts Mlotkowski Safran
主权项 1. A method, comprising: forming a guard ring structure comprising a plurality of metal layers within dielectric layers; and forming diffusion regions to electrically insulate a gap in a substrate formed by segmented portions of the guard ring structure, wherein the diffusion regions are formed in a high resistivity substrate, and a noble implant region is implanted into the high resistivity substrate, below a shallow trench isolation (STI) structure.
地址 Armonk NY US