发明名称 ELECTRO-OPTIC DEVICE, METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To enhance uniformity of film thickness of an insulating film that adjusts an optical distance in an optical resonance structure.SOLUTION: An electro-optic device includes: a substrate 10s; and a power supply line 14, a first insulating film 28 having a part with a film thickness Bd1, a part with a film thickness Gd1, and a part with a film thickness Rd1, a pixel electrode 31, a light-emitting functional layer 32, and a counter electrode 33, successively formed on the substrate 10s. The pixel electrode 31 includes a first pixel electrode 31B disposed in the part with the film thickness Bd1, a second pixel electrode 31G disposed in the part with the film thickness Gd1, and a third pixel electrode 31R disposed in the part with the film thickness Rd1. The first insulating film 28 contains impurities for controlling etching property of the first insulating film 28, and the concentration of the impurities gradually decreases in an order from the part with the film thickness Bd1, the part with the film thickness Gd1, and the part with the film thickness Rd1.</p>
申请公布号 JP2015056210(A) 申请公布日期 2015.03.23
申请号 JP20130187146 申请日期 2013.09.10
申请人 SEIKO EPSON CORP 发明人 SHISHIKURA ISAO
分类号 H05B33/22;H01L21/306;H01L21/3065;H01L51/50;H05B33/10;H05B33/12;H05B33/24 主分类号 H05B33/22
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