ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition that excels in exposure latitude, pattern line width uniformity (CDU) within a wafer plane, and a pattern profile, a resist film and a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: (A) a compound that generates an acid expressed by general formula (I) or (II) below by irradiation with actinic rays or radiation; and (B) a resin having a group that is decomposed by an action of an acid to generate a polar group.