发明名称 |
ANNEAL MODULE FOR SEMICONDUCTOR WAFERS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an anneal module for annealing semiconductor material wafers and similar substrates, the module reducing particle contamination and oxygen ingress while providing uniform heating including 500°C processes.SOLUTION: The anneal module may include a process chamber formed in a metal body having internal cooling lines. A hot plate has a pedestal supported on a thermal choke on the body. A gas distributor in a lid over the hot plate causes gas to flow uniformly over a wafer surface. A transfer mechanism moves a hoop to shift the wafer between the hot plate and a cold plate.</p> |
申请公布号 |
JP2015056669(A) |
申请公布日期 |
2015.03.23 |
申请号 |
JP20140185914 |
申请日期 |
2014.09.12 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
VINCENT STEFFAN FRANCISCHETTI;GREGORY J WILSON;KYLE M HANSON;PAUL WIRTH;ROBERT B MOORE |
分类号 |
H01L21/02;H01L21/265;H01L21/324;H01L21/677 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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