发明名称 ANNEAL MODULE FOR SEMICONDUCTOR WAFERS
摘要 <p>PROBLEM TO BE SOLVED: To provide an anneal module for annealing semiconductor material wafers and similar substrates, the module reducing particle contamination and oxygen ingress while providing uniform heating including 500°C processes.SOLUTION: The anneal module may include a process chamber formed in a metal body having internal cooling lines. A hot plate has a pedestal supported on a thermal choke on the body. A gas distributor in a lid over the hot plate causes gas to flow uniformly over a wafer surface. A transfer mechanism moves a hoop to shift the wafer between the hot plate and a cold plate.</p>
申请公布号 JP2015056669(A) 申请公布日期 2015.03.23
申请号 JP20140185914 申请日期 2014.09.12
申请人 APPLIED MATERIALS INC 发明人 VINCENT STEFFAN FRANCISCHETTI;GREGORY J WILSON;KYLE M HANSON;PAUL WIRTH;ROBERT B MOORE
分类号 H01L21/02;H01L21/265;H01L21/324;H01L21/677 主分类号 H01L21/02
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