| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photocurable resin composition exhibiting good releasing performance, from which a high-accuracy pattern can be formed by an imprint method, and to provide a pattern forming method using the photocurable resin composition.SOLUTION: The photocurable resin composition comprises at least one type of acrylic monomer, a polymerization initiator, and a fluorine-based surfactant, and shows a surface tension of 28 mN/m or less in air.</p> |
