Apparatus for processing substrate

摘要

The present invention relates to a substrate processing apparatus. The substrate processing apparatus includes a chamber having an interior space; a guide pipe which crosses the interior space of the chamber and is flexible, and has a hollow part which is separated from the interior space and is connected to the outside; and a support frame which is formed in the chamber and is connected to at least part of the guide plate. It prevents the contamination of the inside of the chamber due to a foreign material and can facilitate maintenance.