发明名称 Method of Fabricating CIGS Film
摘要 <p>Disclosed is a method for manufacturing a CIGS thin film comprising a thin film solar cell. The CIGS thin film is formed by performing a thermal process and applying a voltage of a pulse train type to which a high level and a low level are repetitively applied. Se or Cu ions are electrodeposited by applying the voltage of the high level. Ga and In ions are electrodeposited by applying the voltage of the low level. Also, the voltage applied to a working electrode is applied with a step pulse of a three-step level. Accordingly, the GIGS thin film is formed in a fast processing time.</p>
申请公布号 KR20150030813(A) 申请公布日期 2015.03.23
申请号 KR20130109655 申请日期 2013.09.12
申请人 INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY 发明人 KIM, JIN HYEOK;SHIN, SEUNG WOOK;LEE, JEONG YONG;MOON, JONG HA;KIM, YU KYUNG
分类号 H01L31/04;H01L31/18 主分类号 H01L31/04
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