| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electro-optic device capable of improving reliability, a substrate for an electro-optic device, an electro-optic device, and electronic equipment.SOLUTION: The method for manufacturing a substrate for an electro-optic device includes the steps of: forming an insulating layer 11 on a base material; forming a first wiring line 51 and a second wiring line 52 on the insulating layer 11; forming a color filter 80 on the insulating layer 11 in a region interposed between first wiring lines 51; forming a first oxide film on the first wiring line 51, the second wiring line 52, the color filter 80 and the insulating layer 11; etching the first oxide film to form a sidewall 61a comprising a part of the first oxide film on a side face of the first wiring line 51 and on a side face of the second wiring line 52; forming a second oxide film 62 on the first wiring line 51, the second wiring line 52, the sidewall 61a, the color filter 80, and the insulating layer 11; flattening the surface of the second oxide film 62; and forming a pixel electrode 27 on the second oxide film 62. |
