发明名称 |
ANTI-REFLECTION FILM-FORMING COMPOSITION AND MANUFACTURING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To form an anti-reflection film for preventing reflection of light rays irradiated from an eternal light source while maintaining light transmittance of a transparent conductive film or the like on which the anti-reflection film is formed.SOLUTION: An anti-reflection film-forming composition is coated on a transparent conductive film, glass, or light transmissive plastic having a refractive index in a range of 1.6-2.0 at a wavelength of 550 nm to form an anti-reflection film having a lower refractive index. The anti-reflection film-forming composition contains a hydrolysate of a metal alkoxide, and phosphoric acid. Defining A (mol/L) as molar concentration of metal of the metal alkoxide and B (mol/L) as molar concentration of the phosphoric acid, B/A shall be in a range of 0.002 to 0.1. |
申请公布号 |
JP2015055715(A) |
申请公布日期 |
2015.03.23 |
申请号 |
JP20130188182 |
申请日期 |
2013.09.11 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
YAMAZAKI KAZUHIKO;HYUGANO REIKO;YONEZAWA TAKEHIRO |
分类号 |
G02B1/11;B32B7/02;B32B27/00 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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