CLEANING SOLUTION FOR NITROGEN SURFACE OF GaN SUBSTRATE AND METHOD OF CLEANING NITROGEN SURFACE OF GaN SUBSTRATE USING THE SAME

摘要

The present invention relates to a washing solution for a gallium nitride substrate and a method for washing a gallium nitride substrate using the same and, more specifically, to a washing solution for a gallium nitride substrate which can minimize an increase in the surface profile of an N surface which is a facing surface contacting another substrates for a layer transition process of both side surfaces of the gallium nitride substrate and can easily remove a particle adhered on the surface simultaneously, and a method for washing a gallium nitride substrate using the same. To this end, the washing solution for washing the N surface of the gallium nitride substrate which is a facing surface contacting another substrates includes a base solution and an organic additive.