| 发明名称 |
Large scale plate and method for uniform polishing of the same |
| 摘要 |
<p>Disclosed is a substrate polishing method capable of minimizing a difference of polishing amounts between a center portion and a rim portion of a large scale plate during a plate polishing process.</p> |
| 申请公布号 |
KR101504221(B1) |
申请公布日期 |
2015.03.20 |
| 申请号 |
KR20100074710 |
申请日期 |
2010.08.02 |
| 申请人 |
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发明人 |
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| 分类号 |
B24B1/00;B24B7/20;B24B49/00;H01L21/304 |
主分类号 |
B24B1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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