| 摘要 |
Method to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing material is reclaimed from a polishing-material slurry including already used polishing material by undergoing: recovering the polishing-material slurry used to polish an object having silicon as a main component thereof; adjusting the pH of the recovered polishing-material slurry to be in the range of 7-10; adding an alkali earth metal-containing metal salt as an inorganic salt to the pH adjusted polishing-material slurry, to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; and the polishing material, having been separated and concentrated, is subjected to solid-liquid separation, and recovered. |
