| 摘要 |
<p>An antireflection film having high stain resistance is provided. The antireflection film 10 includes a transparent substrate 11, a high-refractive index layer 12, and a low-refractive index layer 15. The low-refractive index layer 15 is formed of a cured product of a polymerizable composition containing hollow fine particles such as hollow silica particles, a modified silicone compound, and a second resin component such as a polyfunctional (meth)acrylate.</p> |
