发明名称 |
COATING ARCHITECTURE FOR PLASMA SPRAYED CHAMBER COMPONENTS |
摘要 |
A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%. A plasma spray thin film, plasma spray chemical vapor deposition or plasma spray physical vapor deposition process is then performed by the low pressure plasma spraying system to deposit a second plasma resistant layer on the first plasma resistant layer, the second plasma resistant layer having a thickness of less than 50 microns and a porosity of less than 1%. |
申请公布号 |
US2015079370(A1) |
申请公布日期 |
2015.03.19 |
申请号 |
US201414462057 |
申请日期 |
2014.08.18 |
申请人 |
Applied Materials, Inc. |
发明人 |
Sun Jennifer Y.;Chen Yikai;Kanungo Biraja P. |
分类号 |
C23C4/12;C23C4/10 |
主分类号 |
C23C4/12 |
代理机构 |
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代理人 |
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主权项 |
1. An article comprising:
a body; a first plasma-sprayed plasma resistant ceramic layer on at least one surface of the body, the first plasma resistant ceramic layer having a porosity of 1-5% and a thickness of 20-500 microns; and a second plasma-sprayed plasma resistant ceramic layer on the first plasma-sprayed plasma resistant ceramic layer, the second plasma-sprayed plasma resistant ceramic layer having a porosity of less than 1% and a thickness of less than 100 microns. |
地址 |
Santa Clara CA US |