发明名称 COATING ARCHITECTURE FOR PLASMA SPRAYED CHAMBER COMPONENTS
摘要 A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%. A plasma spray thin film, plasma spray chemical vapor deposition or plasma spray physical vapor deposition process is then performed by the low pressure plasma spraying system to deposit a second plasma resistant layer on the first plasma resistant layer, the second plasma resistant layer having a thickness of less than 50 microns and a porosity of less than 1%.
申请公布号 US2015079370(A1) 申请公布日期 2015.03.19
申请号 US201414462057 申请日期 2014.08.18
申请人 Applied Materials, Inc. 发明人 Sun Jennifer Y.;Chen Yikai;Kanungo Biraja P.
分类号 C23C4/12;C23C4/10 主分类号 C23C4/12
代理机构 代理人
主权项 1. An article comprising: a body; a first plasma-sprayed plasma resistant ceramic layer on at least one surface of the body, the first plasma resistant ceramic layer having a porosity of 1-5% and a thickness of 20-500 microns; and a second plasma-sprayed plasma resistant ceramic layer on the first plasma-sprayed plasma resistant ceramic layer, the second plasma-sprayed plasma resistant ceramic layer having a porosity of less than 1% and a thickness of less than 100 microns.
地址 Santa Clara CA US