| 摘要 |
PROBLEM TO BE SOLVED: To provide a hydrolyzable silane that is a novel silyl isocyanurate compound as a main component of a composition for forming a resist underlay film for lithography for forming a resist underlay film that can be used as a hard mask, the silyl isocyanurate compound being effective to form the resist underlay film.SOLUTION: A hydrolyzable organosilane expressed by formula (E-1) is provided. In the formula, Rrepresents an alkoxy group, an acyloxy group or a halogen group; Rrepresents an alkylene group having 1 to 10 carbon atoms or an alkylene group having 2 to 10 carbon atoms including a sulfide bond, an ether bond or an ester bond; Rand Reach independently represent an alkyl group having 1 to 3 carbon atoms or a glycidyl group. |
