发明名称 DISCHARGE AUXILIARY-TYPE LASER APERTURE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a forming method of a through-hole in a glass substrate in which necking is hard to occur in a through-hole, and a ring-shaped protrusion is hard to occur around an opening of a through-hole after processing.SOLUTION: A discharge auxiliary-type laser aperture processing method has: (1) a step of adhering resin film having an adhesive layer on a surface of a glass substrate; (2) a step of irradiating the glass substrate with laser light from the resin film side and forming a through-hole on the glass substrate; (3) a step of generating electric discharge via the through-hole after the through-hole is formed and until an operation of stopping the laser light irradiation is performed; (4) a step of reducing adhesive force of the adhesive layer by irradiating the adhesive layer with ultraviolet light or wetting the adhesive layer after the laser light irradiation is stopped; and (5) a step of peeling the resin film having the adhesive layer off from the glass substrate.
申请公布号 JP2015051897(A) 申请公布日期 2015.03.19
申请号 JP20130185591 申请日期 2013.09.06
申请人 ASAHI GLASS CO LTD 发明人 ONO MOTOJI
分类号 C03B29/02;B23K26/00;B23K26/18;B23K26/382;B23K26/60;B23K26/70;C03B33/09 主分类号 C03B29/02
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