| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an ion beam generation device capable of producing plasma with high uniformity and performing more uniform processing.SOLUTION: An ion beam generation device includes: a discharge tank 3; plasma generation means 5 for generating plasma in the discharge tank; an extraction electrode 7 that is provided to oppose a predetermined wall of the discharge tank and extracts an ion beam from the plasma; a member 4 that is provided in the discharge tank, is rotatable, and has an asymmetric shape about its rotation axis; and drive means for rotating the member, wherein the plasma generation means and the drive means are activated to rotate the member for a predetermined time while generating the plasma in the discharge tank, thereby uniformizing a time-averaged plasma density distribution.</p> |
