主权项 |
1. A semiconductor processing apparatus, comprising:
a drive device comprising a plurality of drive units; and a micro chamber configured to receive and process a semiconductor wafer, the micro chamber comprising:
an upper chamber portion defining an upper working surface;a lower chamber portion defining a lower working surface;at least one inlet configured to direct a processing fluid to flow into the micro chamber; andat least one outlet configured to direct the processing fluid to flow out of the micro chamber, wherein the upper chamber portion and the lower chamber portion are relatively moveable towards each other between an open position and a closed position of the micro chamber, wherein when the micro chamber is in the closed position, the upper working surface and the lower working surface form a cavity configured to receive the semiconductor wafer, and a narrow gap is formed among the upper working surface, the lower working surface, wherein an upper part of the upper chamber portion or a lower part of the lower chamber is connected to the drive device or a lower part of the lower chamber portion is connected to the drive device, and wherein the drive device is configured to drive the micro chamber to different positions. |