发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 A nonvolatile semiconductor storage device is provided with a memory-cell region; a peripheral-circuit region disposed adjacent to the memory-cell region a first memory-cell unit disposed in a first layer located in the memory-cell region; a second memory-cell unit disposed in a k-th layer of the memory-cell region where k is an integer equal to or greater than 2, the second memory-cell unit having an element region extending in a first direction and having a first width in a second direction crossing the first direction; and a peripheral-circuit element disposed in the first layer located in the peripheral-circuit region. Two or more dummy element each having a second width 2n+1 times greater than the first width in the second direction are disposed in the k-th layer located in the peripheral-circuit region where n is an integer equal to or greater than 0.
申请公布号 US2015076578(A1) 申请公布日期 2015.03.19
申请号 US201414291816 申请日期 2014.05.30
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAKAMOTO Wataru;YAMADA Kenta
分类号 H01L27/115 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile semiconductor storage device comprising: a memory-cell region; a peripheral-circuit region disposed adjacent to the memory-cell region; a first memory-cell unit disposed in a first layer located in the memory-cell region; a second memory-cell unit disposed in a k-th layer of the memory-cell region where k is an integer equal to or greater than 2, the second memory-cell unit having an element region extending in a first direction and having a first width in a second direction crossing the first direction; and a peripheral-circuit element disposed in the first layer located in the peripheral-circuit region; wherein two or more dummy elements each having a second width 2n+1 times greater than the first width in the second direction are disposed in the k-th layer located in the peripheral-circuit region where n is an integer equal to or greater than 0.
地址 Minato-ku JP