| 摘要 |
The invention relates to a beam guiding apparatus (6), comprising: a vacuum chamber (12), in which a target material (8) is introducible into a target region (7) for generating EUV radiation, wherein the vacuum chamber (12) includes a first opening (13) for the entrance of a first laser beam (3) and a second opening (14) for the entrance of a second laser beam (5), wherein the first laser beam (3) and the second laser beam (5) have different wavelengths (λ-ι, λ2), and a superposition apparatus (24) for superposing the two laser beams (3, 5) entering into the vacuum chamber (12) through the first and the second openings (13, 14) for a common beam guidance in the direction of the target region (7). The superposition apparatus is preferably embodied as a reflecting optical element (24) arranged in the vacuum chamber (12), which optical element includes a first surface region for reflecting the first laser beam (3) and a second surface region, surrounding the first surface region in a ring-shaped manner, for reflecting the second laser beam (5). The invention also relates to an EUV beam generating device (1) comprising such a beam guiding apparatus (6). |
