| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing device and a manufacturing method of a polishing pad which reduce variation of thickness of polishing pads manufactured.SOLUTION: A polishing pad manufacturing device, in which a resin block is sliced in the horizontal direction to manufacture a polishing pad, comprises a loading pedestal on which the resin block is loaded, a slice blade 3 which slice-processes a surface layer of the resin block loaded on the loading pedestal, and a pressing roller 4 which is provided apart by a spacing of a prescribed period in the front side from a blade tip 31 of the slice blade 3 and is disposed at the upper surface of the resin block. The surface layer of the resin block is slice-processed, by moving relatively the resin block, the slice blade 3 and the pressing roller 4. |
