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发明名称
Diffusionsverfahren zum Dotieren einer Oberflaechenschicht von festen Halbleiterkoerpern fuer Halbleiterbauelemente
摘要
申请公布号
DE1288688(B)
申请公布日期
1969.02.06
申请号
DE1955S042700
申请日期
1955.02.15
申请人
SIEMENS AG
发明人
EMEIS;REIMER DR.-ING.
分类号
C30B31/06;H01L21/00;H01L21/223
主分类号
C30B31/06
代理机构
代理人
主权项
地址
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