| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an abrasive material for electronic material having high surface smoothness and high polishing speed with respect to an object to be polished.SOLUTION: An abrasive material for electronic material comprises two or more abrasive grains, at least one of which is an abrasive grain (B). The abrasive grain (B) is an abrasive grain made by covering a particle (B0) with an organic compound (A), and an average particle diameter of the abrasive grains (B) is 1 nm -1000 nm.</p> |
