发明名称 APPARATUS FOR COATING NANOPARTICLES HAVING CORE-SHELL STRUCTURE USING ATOMIC LAYER DEPOSITION
摘要 Disclosed is a coating chamber having a process passage in which a coating process is performed, a particle supply means configured to supply nanoparticles into the process passage, a gas supply means configured to supply a carrier gas and a reactive gas serving as a source of a shell material into the process passage, and a low pressure forming means configured to form a low pressure in the process passage. The coating chamber has a speed adjustment member formed of a porous material or a grid and installed in the process passage, and as a moving speed of the nanoparticles is decreased due to flow resistance or collision of the nanoparticles passing through the speed adjustment member, first and second precursors supplied as the reactive gas move more rapidly than the nanoparticles to coat a thin film on the nanoparticles with the material.
申请公布号 US2015075429(A1) 申请公布日期 2015.03.19
申请号 US201414487110 申请日期 2014.09.16
申请人 Daejin University Center for Educational Industrial Cooperation 发明人 PARK Sungho;CHAE Won-Seok;HAN Man So
分类号 C23C16/455;C23C16/52 主分类号 C23C16/455
代理机构 代理人
主权项 1. An apparatus for coating nanoparticles having a core-shell structure using atomic layer deposition, the apparatus comprising: a coating chamber having a process passage in which a coating process is performed; a particle supply means configured to supply the nanoparticles into the process passage; a gas supply means configured to supply a carrier gas and a reactive gas serving as a source of a shell material into the process passage; and a low pressure forming means configured to form a low pressure in the process passage, wherein the coating chamber has a speed adjustment member formed of a porous material or a grid and installed in the process passage, and as a moving speed of the nanoparticles is decreased due to flow resistance or collision of the nanoparticles passing through the speed adjustment member, first and second precursors supplied as the reactive gas move more rapidly than the nanoparticles to coat a thin film on the nanoparticles with the material.
地址 Pocheon-si KR